Invention Application
US20140374766A1 BI-DIRECTIONAL GALLIUM NITRIDE SWITCH WITH SELF-MANAGED SUBSTRATE BIAS
审中-公开
具有自管理基板偏移的双向氮化镓开关
- Patent Title: BI-DIRECTIONAL GALLIUM NITRIDE SWITCH WITH SELF-MANAGED SUBSTRATE BIAS
- Patent Title (中): 具有自管理基板偏移的双向氮化镓开关
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Application No.: US13922352Application Date: 2013-06-20
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Publication No.: US20140374766A1Publication Date: 2014-12-25
- Inventor: Sandeep R. BAHL , Matthew SENESKY , Naveen TIPIRNENI , David I. ANDERSON , Sameer PENDHARKAR
- Applicant: Texas Instruments Incorporated
- Main IPC: H01L27/06
- IPC: H01L27/06 ; H01L29/20

Abstract:
A semiconductor device includes a bidirectional GaN FET formed on a non-insulating substrate. The semiconductor device further includes a first electrical clamp connected between the substrate and a first source/drain node of the bidirectional GaN FET, and a second electrical clamp connected between the substrate and a second source/drain node of the bidirectional GaN FET. The first clamp and the second clamp are configured to bias the substrate at a lower voltage level of an applied bias to the first source/drain node and an applied bias to the second source/drain node, within an offset voltage of the relevant clamp.
Information query
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