发明申请
- 专利标题: GAN-BASED SCHOTTKY BARRIER DIODE WITH ALGAN SURFACE LAYER
- 专利标题(中): 基于GAN的肖特基二极管与ALGAN表面层
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申请号: US14479634申请日: 2014-09-08
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公开(公告)号: US20140374769A1公开(公告)日: 2014-12-25
- 发明人: Richard J. Brown , Thomas R. Prunty , David P. Bour , Isik C. Kizilyalli , Hui Nie , Andrew P. Edwards , Linda Romano , Madhan Raj
- 申请人: Avogy, Inc.
- 主分类号: H01L29/872
- IPC分类号: H01L29/872 ; H01L29/47 ; H01L29/205 ; H01L21/02 ; H01L29/66
摘要:
A Schottky diode and method of fabricating the Schottky diode using gallium nitride (GaN) materials is disclosed. The method includes providing an n-type GaN substrate having first and second opposing surfaces. The method also includes forming an ohmic metal contact electrically coupled to the first surface, forming an n-type GaN epitaxial layer coupled to the second surface, and forming an n-type aluminum gallium nitride (AlGaN) surface layer coupled to the n-type GaN epitaxial layer. The AlGaN surface layer has a thickness which is less than a critical thickness, and the critical thickness is determined based on an aluminum mole fraction of the AlGaN surface layer. The method also includes forming a Schottky contact electrically coupled to the n-type AlGaN surface layer, where, during operation, an interface between the n-type GaN epitaxial layer and the n-type AlGaN surface layer is substantially free from a two-dimensional electron gas.
公开/授权文献
- US09450112B2 GaN-based Schottky barrier diode with algan surface layer 公开/授权日:2016-09-20
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