- 专利标题: COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND
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申请号: US14032528申请日: 2013-09-20
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公开(公告)号: US20140377707A9公开(公告)日: 2014-12-25
- 发明人: Shinya MINEGISHI , Kiyoshi TANAKA , Kazunori KUSABIRAKI
- 申请人: JSR CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: JSR CORPORATION
- 当前专利权人: JSR CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2012-218885 20120928
- 主分类号: G03F7/11
- IPC分类号: G03F7/11 ; G03F7/20
摘要:
A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R1 represents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 represents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof —CO—, —COO—, —O—, —NR′—, —CS—, —S—, —SO—, —SO2— or a combination thereof; and R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.
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