发明申请
- 专利标题: LOW TEMPERATURE ARC ION PLATING COATING
- 专利标题(中): 低温电弧镀层
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申请号: US14367414申请日: 2012-12-14
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公开(公告)号: US20150001064A1公开(公告)日: 2015-01-01
- 发明人: Siegfried Krassnitzer , Denis Kurapov , Markus Lechthaler
- 申请人: Oerlikon Trading AG, Trubbach
- 优先权: EP11010102.9 20111222
- 国际申请: PCT/EP2012/005161 WO 20121214
- 主分类号: C23C14/34
- IPC分类号: C23C14/34
摘要:
Coating method for arc coating or arc ion plating coating of substrates in a vacuum chamber in which using an arc evaporator solid material that functions as cathode is evaporated, during arc evaporation the motion of the cathode spot on the solid material surface is accelerated using a magnetic field for avoiding ejection of a large amount of macro-particles or droplets from the solid material surface, negative charged particles resulted from the arc evaporation flow from the cathode to an anode, characterized by the motion of the negative charged particles from the cathode to the anode fundamentally doesn't cause an additional increase of the absolute value of the potential difference between cathode and anode allowing a lower increment of the substrate temperature during coating.
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