发明申请
US20150001466A1 GROUP III-V COMPOUND SEMICONDUCTOR PHOTO DETECTOR, METHOD OF FABRICATING GROUP III-V COMPOUND SEMICONDUCTOR PHOTO DETECTOR, PHOTO DETECTOR, AND EPITAXIAL WAFER
审中-公开
III-V族化合物半导体照相检测器,III-V族化合物半导体照相检测器,照相检测器和外延波形的方法
- 专利标题: GROUP III-V COMPOUND SEMICONDUCTOR PHOTO DETECTOR, METHOD OF FABRICATING GROUP III-V COMPOUND SEMICONDUCTOR PHOTO DETECTOR, PHOTO DETECTOR, AND EPITAXIAL WAFER
- 专利标题(中): III-V族化合物半导体照相检测器,III-V族化合物半导体照相检测器,照相检测器和外延波形的方法
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申请号: US14490128申请日: 2014-09-18
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公开(公告)号: US20150001466A1公开(公告)日: 2015-01-01
- 发明人: Katsushi Akita , Takashi Ishizuka , Kei Fujii , Youichi Nagai
- 申请人: Sumitomo Electric Industries, Ltd.
- 优先权: JP2009-206288 20090907; JP2009-206310 20090907
- 主分类号: H01L31/0352
- IPC分类号: H01L31/0352 ; H01L31/0304
摘要:
An object of the present invention is to provide a group III-V compound semiconductor photo detector comprising an absorption layer having a group III-V compound semiconductor layer containing Sb as a group V constituent element, and an n-type InP window layer, resulting in reduced dark current. The InP layer 23 grown on the absorption layer 23 contains antimony as impurity, due to the memory effect with antimony which is supplied during the growth of a GaAsSb layer of the absorption layer 21. In the group III-V compound semiconductor photo detector 11, the InP layer 23 contains antimony as impurity and is doped with silicon as n-type dopant. Although antimony impurities in the InP layer 23 generate holes, the silicon contained in the InP layer 23 compensates for the generated carriers. As a result, the second portion 23d of the InP layer 23 has sufficient n-type conductivity.
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