Invention Application
- Patent Title: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
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Application No.: US14476936Application Date: 2014-09-04
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Publication No.: US20150010857A1Publication Date: 2015-01-08
- Inventor: Natsumi YOKOKAWA , Hiroo TAKIZAWA , Hideaki TSUBAKI
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2012-064522 20120321
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/30
Abstract:
There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).
Public/Granted literature
Information query
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