发明申请
- 专利标题: APPARATUS AND METHOD FOR HEAT TREATING A GLASS SUBSTRATE
- 专利标题(中): 用于加热处理玻璃基板的装置和方法
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申请号: US14456401申请日: 2014-08-11
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公开(公告)号: US20150013392A1公开(公告)日: 2015-01-15
- 发明人: Frank Coppola , Monica Jo Mashewske
- 申请人: Corning Incorporated
- 主分类号: C03B32/00
- IPC分类号: C03B32/00 ; C03B35/20 ; C03B25/02
摘要:
An apparatus and method for heat treating a plurality of glass substrates. The glass substrates are supported on support platform and housed in a heat treating furnace. The substrates are supported in a substantially vertical orientation by restraining pins extending through walls of the furnace, and are separated from each other by frame-shaped spacing members. The spacing members reduce convection currents between the substrates and reduce or eliminate the post-heat treating distortion of each glass substrate to less than 100 μm over the entire surface of the substrate.
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