Invention Application
- Patent Title: Radiation Source and Lithographic Apparatus
- Patent Title (中): 辐射源和平版印刷设备
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Application No.: US14383359Application Date: 2013-02-07
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Publication No.: US20150015863A1Publication Date: 2015-01-15
- Inventor: Antonius Theodorus Wilhelmus Kempen , John Frederik Dijkusman , Jan Jan Meastrom
- Applicant: ASML Netherland B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherland B.V.
- Current Assignee: ASML Netherland B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2013/052420 WO 20130207
- Main IPC: H05G2/00
- IPC: H05G2/00 ; B05B17/06 ; G03F7/20
Abstract:
The present invention provides a method of monitoring the operation of a radiation source fuel droplet stream generator comprising a fuel-containing capillary and a piezo-electric actuator (500). The method comprises analysing the resonance frequency spectrum of a system comprising the fuel-containing capillary and the piezo-electric actuator in particular to look for changes in the resonance frequencies of the acoustic system which may be indicative of a change in the properties of the system requiring investigation.
Public/Granted literature
- US09510432B2 Radiation source and lithographic apparatus Public/Granted day:2016-11-29
Information query
