Invention Application
- Patent Title: WAFER AND RETICLE INSPECTION SYSTEMS AND METHODS FOR SELECTING ILLUMINATION PUPIL CONFIGURATIONS
- Patent Title (中): 滤波器和检测系统以及选择灯光配置的方法
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Application No.: US14381315Application Date: 2013-03-01
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Publication No.: US20150015874A1Publication Date: 2015-01-15
- Inventor: Grace H. Chen , Rudolf Brunner , Lisheng Gao , Robert M. Danen , Lu Chen
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- International Application: PCT/US13/28650 WO 20130301
- Main IPC: G01N21/88
- IPC: G01N21/88

Abstract:
In an optical inspection tool, an illumination aperture is opened at each of a plurality of aperture positions of an illumination pupil area one at a time across the illumination pupil area. For each aperture opening position, an incident beam is directed towards the illumination pupil area so as to selectively pass a corresponding ray bundle of the illumination beam at a corresponding set of one or more incident angles towards the sample and an output beam, which is emitted from the sample in response to the corresponding ray bundle of the incident beam impinging on the sample at the corresponding set of one or more incident angles, is detected. A defect detection characteristic for each aperture position is determined based on the output beam detected for each aperture position. An optimum aperture configuration is determined based on the determined defect detection characteristic for each aperture position.
Public/Granted literature
- US09347891B2 Wafer and reticle inspection systems and methods for selecting illumination pupil configurations Public/Granted day:2016-05-24
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