Invention Application
- Patent Title: METHOD AND SYSTEM TO REDUCE OUTGASSING IN A REACTION CHAMBER
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Application No.: US13941134Application Date: 2013-07-12
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Publication No.: US20150017319A1Publication Date: 2015-01-15
- Inventor: Sung-Hoon Jung , Petri Raisanen , Eric Jen Cheng Liu , Mike Schmotzer
- Applicant: ASM IP Holding B.V.
- Main IPC: C23C16/44
- IPC: C23C16/44

Abstract:
Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
Public/Granted literature
- US08993054B2 Method and system to reduce outgassing in a reaction chamber Public/Granted day:2015-03-31
Information query
IPC分类: