公开(公告)号：US08993054B2

公开(公告)日：2015-03-31

申请号：US13941134

申请日：2013-07-12

Applicant: ASM IP Holding B.V.

Inventor： Sung-Hoon Jung ,  Petri Raisanen ,  Eric Jen Cheng Liu ,  Mike Schmotzer

IPC: C23C16/00 ,  C23C16/44 ,  C23C16/455

CPC classification number: C23C16/4404 ,  C23C16/4405 ,  C23C16/45525 ,  C23C16/45534 ,  C23C16/45544

Abstract: Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.

Abstract translation: 公开了在反应器的反应室内减少物质的除气的系统和方法。 示例性方法包括在反应室内沉积阻挡层并使用清除前体与反应室表面上的物质反应。 示例性系统包括气相沉积系统，例如原子层沉积系统，其包括流体耦合到系统的反应室的阻挡层源和/或清除前体源。

公开(公告)号：US20150140210A1

公开(公告)日：2015-05-21

申请号：US14606364

申请日：2015-01-27

Applicant: ASM IP HOLDING B.V.

Inventor： Sung-Hoon Jung ,  Petri Raisanen ,  Eric Jen Cheng Liu ,  Mike Schmotzer

IPC: C23C16/44 ,  C23C16/455

CPC classification number: C23C16/4404 ,  C23C16/4405 ,  C23C16/45525 ,  C23C16/45534 ,  C23C16/45544

Abstract: Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.

Abstract translation: 公开了在反应器的反应室内减少物质的除气的系统和方法。 示例性方法包括在反应室内沉积阻挡层并使用清除前体与反应室表面上的物质反应。 示例性系统包括气相沉积系统，例如原子层沉积系统，其包括流体耦合到系统的反应室的阻挡层源和/或清除前体源。

公开(公告)号：US09790595B2

公开(公告)日：2017-10-17

申请号：US14606364

申请日：2015-01-27

Applicant: ASM IP Holding B.V.

Inventor： Sung-Hoon Jung ,  Petri Raisanen ,  Eric Jen Cheng Liu ,  Mike Schmotzer

IPC: C23C16/42 ,  C23C16/44 ,  C23C16/455

CPC classification number: C23C16/4404 ,  C23C16/4405 ,  C23C16/45525 ,  C23C16/45534 ,  C23C16/45544

Abstract: Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.

公开(公告)号：US20150017319A1

公开(公告)日：2015-01-15

申请号：US13941134

申请日：2013-07-12

Applicant: ASM IP Holding B.V.

Inventor： Sung-Hoon Jung ,  Petri Raisanen ,  Eric Jen Cheng Liu ,  Mike Schmotzer

IPC: C23C16/44

CPC classification number: C23C16/4404 ,  C23C16/4405 ,  C23C16/45525 ,  C23C16/45534 ,  C23C16/45544

Abstract: Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.