Invention Application
- Patent Title: INDUCTOR ELEMENT AND METHOD OF MANUFACTURING THE SAME
- Patent Title (中): 电感元件及其制造方法
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Application No.: US14459963Application Date: 2014-08-14
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Publication No.: US20150048920A1Publication Date: 2015-02-19
- Inventor: Hwan Soo LEE , Hye Yeon CHA , Young Sik CHOI , Sung Kwon WI
- Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Priority: KR10-2013-0096645 20130814
- Main IPC: H01F27/24
- IPC: H01F27/24 ; C25D7/00 ; H01F41/02 ; C25D5/02

Abstract:
Disclosed herein is an inductor element having an internal electrode in which a first plating layer and a second plating layer having a coil shape are embedded, the inductor element including: a first plating layer formed on a support member; an insulating layer covering the first plating layer and provided with an opening which exposes an upper surface of the first plating layer; and a second plating layer filled in the opening, whereby the inductor element in which the internal electrode having a high aspect ratio is embedded is implemented.
Information query