发明申请
- 专利标题: VACUUM CHUCK
- 专利标题(中): 真空罐
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申请号: US14389192申请日: 2012-03-28
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公开(公告)号: US20150069723A1公开(公告)日: 2015-03-12
- 发明人: Jian Wang , Yinuo Jin , Yong Shao , Hui Wang
- 申请人: Jian Wang , Yinuo Jin , Yong Shao , Hui Wang
- 申请人地址: CN Shanghai
- 专利权人: ACM Research (Shanghai) Inc,.
- 当前专利权人: ACM Research (Shanghai) Inc,.
- 当前专利权人地址: CN Shanghai
- 国际申请: PCT/CN2012/073175 WO 20120328
- 主分类号: H01L21/683
- IPC分类号: H01L21/683 ; B23B31/30
摘要:
A vacuum chuck is disclosed for holding and positioning wafers more stably and securely. The vacuum chuck includes a supporting assembly having a receiving groove and at least one first vacuum aperture defined in the receiving groove. A seal unit includes a seal ring bulging to form a vacuum trough. The seal ring is fixed in the receiving groove of the supporting assembly and has at least one second vacuum aperture communicating with the first vacuum aperture. A chuck connector fastened with the supporting assembly has at least one vacuum port and at least one vacuum orifice communicating with the vacuum port. At least one vacuum hose connects the first vacuum aperture, the second vacuum aperture with the vacuum orifice and the vacuum port of the chuck connector for evacuating the air of the vacuum trough to hold and position the wafer on the seal ring and the supporting assembly.
公开/授权文献
- US09558985B2 Vacuum chuck 公开/授权日:2017-01-31
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