Invention Application
- Patent Title: SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Patent Title (中): 等离子体反应器的对称甚高频源
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Application No.: US14548692Application Date: 2014-11-20
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Publication No.: US20150075719A1Publication Date: 2015-03-19
- Inventor: Kartik Ramaswamy , Igor Markovsky , Zhigang Chen , James D. Carducci , Kenneth S. Collins , Shahid Rauf , Nipun Misra , Leonid Dorf , Zheng John Ye
- Applicant: APPLIED MATERIALS, INC.
- Main IPC: H01J37/32
- IPC: H01J37/32
Abstract:
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Public/Granted literature
- US09824862B2 Symmetric VHF source for a plasma reactor Public/Granted day:2017-11-21
Information query
