发明申请
US20150083898A1 System and Method for Controlling Droplet Timing in an LPP EUV Light Source
有权
用于控制LPP EUV光源中的液滴时序的系统和方法
- 专利标题： System and Method for Controlling Droplet Timing in an LPP EUV Light Source
- 专利标题（中）： 用于控制LPP EUV光源中的液滴时序的系统和方法
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申请号： US14037817申请日： 2013-09-26
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公开(公告)号： US20150083898A1公开(公告)日： 2015-03-26
- 发明人: Vahan Senekerimyan , Martijn Wehrens
- 申请人： Cymer, Inc.
- 申请人地址： US CA San Diego
- 专利权人： Cymer, Inc.
- 当前专利权人： Cymer, Inc.
- 当前专利权人地址： US CA San Diego
- 主分类号： H05G2/00
- IPC分类号： H05G2/00
摘要：
A method and apparatus for improved control of the trajectory and timing of droplets of target material in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A droplet illumination module generates two laser curtains for detecting the droplets. The first curtain is used for detecting the position of the droplets relative to a desired trajectory to the irradiation site so that the position of a droplet generator may be adjusted to direct the droplets to the irradiation site, as in the prior art. A droplet detection module detects each droplet as it passes through the second curtain, determines when the source laser should generate a pulse so that the pulse arrives at the irradiation site at the same time as the droplet, and sends a signal to the source laser to fire at the correct time.
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