发明申请
- 专利标题： DEFECT INSPECTION APPARATUS AND METHOD
- 专利标题（中）： 缺陷检查装置和方法
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申请号： US14062802申请日： 2013-10-24
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公开(公告)号： US20150116701A1公开(公告)日： 2015-04-30
- 发明人: Chun-Yen HO , Tsung-Hsien Lee , Han-Tang Lo
- 申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 申请人地址： TW Hsinchu
- 专利权人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人： Taiwan Semiconductor Manufacturing Co., Ltd.
- 当前专利权人地址： TW Hsinchu
- 主分类号： G01N21/95
- IPC分类号： G01N21/95 ; H01L21/66
摘要：
A defect inspection apparatus is disclosed that includes a stage, a photosensitive element, and a controller. The stage can support a semiconductor element that has a plurality of complete dies and partial dies surrounding the complete dies. The photosensitive element is located above the stage. The controller is electrically connected to the photosensitive element to drive the photosensitive element to inspect the defects of the complete dies and the partial dies.
公开/授权文献
- US09188547B2 Defect inspection apparatus and method 公开/授权日：2015-11-17
信息查询
