发明申请
- 专利标题: ELECTRODE MATERIALS AND INTERFACE LAYERS TO MINIMIZE CHALCOGENIDE INTERFACE RESISTANCE
- 专利标题(中): 电极材料和界面层,以最小化氯化铝界面电阻
-
申请号: US14073927申请日: 2013-11-07
-
公开(公告)号: US20150123066A1公开(公告)日: 2015-05-07
- 发明人: F. Daniel Gealy , Andrea Gotti , Davide Colombo , Kuo-Wei Chang
- 申请人: F. Daniel Gealy , Andrea Gotti , Davide Colombo , Kuo-Wei Chang
- 主分类号: H01L27/24
- IPC分类号: H01L27/24 ; H01L45/00
摘要:
A phase-change memory cell having a reduced electrode-chalcogenide interface resistance and a method for making the phase-change memory cell are disclosed: An interface layer is formed between an electrode layer and a chalcogenide layer that and provides a reduced resistance between the chalcogenide-based phase-change memory layer and the electrode layer. Exemplary embodiments provide that the interface layer comprises a tungsten carbide, a molybdenum carbide, a tungsten boride, or a molybdenum boride, or a combination thereof. In one exemplary embodiment, the interface layer comprises a thickness of between about 1 nm and about 10 nm.
公开/授权文献
信息查询
IPC分类: