Invention Application
- Patent Title: SEMICONDUCTOR DEVICE INCLUDING A RESISTOR AND METHOD FOR THE FORMATION THEREOF
- Patent Title (中): 包括电阻器的半导体器件及其形成方法
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Application No.: US14602940Application Date: 2015-01-22
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Publication No.: US20150137316A1Publication Date: 2015-05-21
- Inventor: Alexandru Romanescu
- Applicant: GLOBALFOUNDRIES Inc.
- Main IPC: H01L29/8605
- IPC: H01L29/8605

Abstract:
A semiconductor structure includes a substrate and a resistor provided over the substrate. The resistor includes a first material layer, a second material layer, a first contact structure and a second contact structure. The first material layer includes at least one of a metal and a metal compound. The second material layer includes a semiconductor material. The second material layer is provided over the first material layer and includes a first sub-layer and a second sub-layer. The second sub-layer is provided over the first sub-layer. The first sub-layer and the second sub-layer are differently doped. Each of the first contact structure and the second contact structure provides an electrical connection to the second sub-layer of the second material layer.
Public/Granted literature
- US09478671B2 Semiconductor device including a resistor and method for the formation thereof Public/Granted day:2016-10-25
Information query
IPC分类: