Invention Application
- Patent Title: OPTICAL METROLOGY SYSTEM FOR SPECTRAL IMAGING OF A SAMPLE
- Patent Title (中): 用于光谱成像的光学计量系统
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Application No.: US14091199Application Date: 2013-11-26
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Publication No.: US20150146193A1Publication Date: 2015-05-28
- Inventor: Andrzej Buczkowski
- Applicant: Nanometrics Incorporated
- Applicant Address: US CA Milpitas
- Assignee: Nanometrics Incorporated
- Current Assignee: Nanometrics Incorporated
- Current Assignee Address: US CA Milpitas
- Main IPC: G01N21/64
- IPC: G01N21/64 ; G01N21/55 ; G01N21/47

Abstract:
An optical metrology device is capable of detection of any combination of photoluminescence light, specular reflection of broadband light, and scattered light from a line across the width of a sample. The metrology device includes a first light source that produces a first illumination line on the sample. A scanning system may be used to scan an illumination spot across the sample to form the illumination line. A detector spectrally images the photoluminescence light emitted along the illumination line. Additionally, a broadband illumination source may be used to produce a second illumination line on the sample, where the detector spectrally images specular reflection of the broadband illumination along the second illumination line. The detector may also image scattered light from the first illumination line. The illumination lines may be scanned across the sample so that all positions on the sample may be measured.
Public/Granted literature
- US09182351B2 Optical metrology system for spectral imaging of a sample Public/Granted day:2015-11-10
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