Invention Application
- Patent Title: IMAGE SYNCHRONIZATION OF SCANNING WAFER INSPECTION SYSTEM
- Patent Title (中): 扫描波形检测系统的图像同步
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Application No.: US14634372Application Date: 2015-02-27
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Publication No.: US20150170357A1Publication Date: 2015-06-18
- Inventor: Kai Cao , Dennis G. Emge , Zhiqin Wang , Jamie M. Sullivan , Wenjian Cai , Henrik Nielsen
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Main IPC: G06T7/00
- IPC: G06T7/00

Abstract:
An inspection system comprises a beam generator module for deflecting spots across scan portions of a specimen. The system also includes detection channels for sensing light emanating from a specimen in response to an incident beam directed towards such specimen and generating a detected image for each scan portion. The system comprises a synchronization system comprising clock generator modules for generating timing signals for deflectors of the beam generator module to scan the spots across the scan portions at a specified frequency and each of the detection channels to generate the corresponding detected image at a specified sampling rate. The timing signals are generated based on a common system clock and cause the deflectors to scan the spots and the detection channels to generate a detected image at a synchronized timing so as to minimize jitter between the scan portions in the response image.
Public/Granted literature
- US09208553B2 Image synchronization of scanning wafer inspection system Public/Granted day:2015-12-08
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