System and Method for Apodization in a Semiconductor Device Inspection System
    1.
    发明申请
    System and Method for Apodization in a Semiconductor Device Inspection System 有权
    半导体器件检测系统中的变迹系统和方法

    公开(公告)号:US20160054232A1

    公开(公告)日:2016-02-25

    申请号:US14930254

    申请日:2015-11-02

    Abstract: An inspection system with selectable apodization includes a selectably configurable apodization device disposed along an optical pathway of an optical system. The apodization device includes one or more apodization elements operatively coupled to one or more actuation stages. The one or more actuation stages are configured to selectably actuate the one or more apodization elements along one or more directions. The inspection system includes a control system communicatively coupled to the one or more actuation stages. The control system is configured to selectably control an actuation state of at the one or more apodization elements so as to apply a selected apodization profile formed with the one or more apodization elements.

    Abstract translation: 具有可选择变迹的检查系统包括沿着光学系统的光学路径设置的可选择地配置的变迹装置。 变迹装置包括一个或多个操作性地耦合到一个或多个致动级的变迹元件。 所述一个或多个致动台被配置成沿着一个或多个方向可选地致动所述一个或多个变迹元件。 检查系统包括通信地耦合到一个或多个致动级的控制系统。 控制系统被配置为可选择地控制在一个或多个变迹元件处的致动状态,以便施加与所述一个或多个变迹元件形成的选择的变迹轮廓。

    System and method for apodization in a semiconductor device inspection system
    2.
    发明授权
    System and method for apodization in a semiconductor device inspection system 有权
    半导体器件检测系统中的变迹的系统和方法

    公开(公告)号:US09176069B2

    公开(公告)日:2015-11-03

    申请号:US13760829

    申请日:2013-02-06

    Abstract: An inspection system with selectable apodization includes an illumination source configured to illuminate a surface of a sample, a detector configured to detect at least a portion of light emanating from the surface of the sample, the illumination source and the detector being optically coupled via an optical pathway of an optical system, a selectably configurable apodization device disposed along the optical pathway, wherein the apodization device includes one or more apodization elements operatively coupled to one or more actuation stages configured to selectably actuate the one or more apodization elements along one or more directions, and a control system communicatively coupled to the one or more actuation and configured to selectably control apodization of illumination transmitted along the optical pathway by controlling an actuation state of the one or more apodization elements.

    Abstract translation: 具有可选择变迹的检查系统包括被配置为照亮样品表面的照明源,被配置为检测从样品表面发出的至少一部分光的检测器,所述照明源和检测器通过光学 光学系统的可选择地配置的变迹装置,其中所述变迹装置包括可操作地耦合到一个或多个致动级的一个或多个变迹元件,所述一个或多个致动级被配置成沿着一个或多个方向可选地致动所述一个或多个变迹元件 以及控制系统,其通信地耦合到所述一个或多个致动并被配置为通过控制所述一个或多个变迹元件的致动状态来选择性地控制沿着所述光学路径传输的照明的变迹。

    Image synchronization of scanning wafer inspection system

    公开(公告)号:US09208553B2

    公开(公告)日:2015-12-08

    申请号:US14634372

    申请日:2015-02-27

    CPC classification number: G06T7/0004 G01N21/9501

    Abstract: An inspection system comprises a beam generator module for deflecting spots across scan portions of a specimen. The system also includes detection channels for sensing light emanating from a specimen in response to an incident beam directed towards such specimen and generating a detected image for each scan portion. The system comprises a synchronization system comprising clock generator modules for generating timing signals for deflectors of the beam generator module to scan the spots across the scan portions at a specified frequency and each of the detection channels to generate the corresponding detected image at a specified sampling rate. The timing signals are generated based on a common system clock and cause the deflectors to scan the spots and the detection channels to generate a detected image at a synchronized timing so as to minimize jitter between the scan portions in the response image.

    Image synchronization of scanning wafer inspection system
    5.
    发明授权
    Image synchronization of scanning wafer inspection system 有权
    扫描晶片检测系统的图像同步

    公开(公告)号:US08995746B2

    公开(公告)日:2015-03-31

    申请号:US13898736

    申请日:2013-05-21

    CPC classification number: G06T7/0004 G01N21/9501

    Abstract: An inspection system comprises a beam generator module for deflecting spots across scan portions of a specimen. The system also includes detection channels for sensing light emanating from a specimen in response to an incident beam directed towards such specimen and generating a detected image for each scan portion. The system comprises a synchronization system comprising clock generator modules for generating timing signals for deflectors of the beam generator module to scan the spots across the scan portions at a specified frequency and each of the detection channels to generate the corresponding detected image at a specified sampling rate. The timing signals are generated based on a common system clock and cause the deflectors to scan the spots and the detection channels to generate a detected image at a synchronized timing so as to minimize jitter between the scan portions in the response image.

    Abstract translation: 检查系统包括用于偏转样本的扫描部分上的斑点的束发生器模块。 该系统还包括用于响应于朝向这种样本的入射光束感测从样本发出的光的检测通道,并且为每个扫描部分生成检测到的图像。 该系统包括同步系统,其包括用于产生用于波束发生器模块的偏转器的定时信号的时钟发生器模块,以扫描指定频率的扫描部分上的点和每个检测通道,以指定的采样率产生相应的检测到的图像 。 基于公共系统时钟生成定时信号,并且使得偏转器扫描点和检测通道,以在同步定时产生检测图像,以使响应图像中的扫描部分之间的抖动最小化。

    IMAGE SYNCHRONIZATION OF SCANNING WAFER INSPECTION SYSTEM
    6.
    发明申请
    IMAGE SYNCHRONIZATION OF SCANNING WAFER INSPECTION SYSTEM 有权
    扫描波形检测系统的图像同步

    公开(公告)号:US20140270471A1

    公开(公告)日:2014-09-18

    申请号:US13898736

    申请日:2013-05-21

    CPC classification number: G06T7/0004 G01N21/9501

    Abstract: An inspection system comprises a beam generator module for deflecting spots across scan portions of a specimen. The system also includes detection channels for sensing light emanating from a specimen in response to an incident beam directed towards such specimen and generating a detected image for each scan portion. The system comprises a synchronization system comprising clock generator modules for generating timing signals for deflectors of the beam generator module to scan the spots across the scan portions at a specified frequency and each of the detection channels to generate the corresponding detected image at a specified sampling rate. The timing signals are generated based on a common system clock and cause the deflectors to scan the spots and the detection channels to generate a detected image at a synchronized timing so as to minimize jitter between the scan portions in the response image.

    Abstract translation: 检查系统包括用于偏转样本的扫描部分上的斑点的束发生器模块。 该系统还包括用于响应于朝向这种样本的入射光束感测从样本发出的光的检测通道,并且为每个扫描部分生成检测到的图像。 该系统包括同步系统,其包括用于产生用于波束发生器模块的偏转器的定时信号的时钟发生器模块,以扫描指定频率的扫描部分上的点和每个检测通道,以指定的采样率产生相应的检测图像 。 基于公共系统时钟生成定时信号,并且使得偏转器扫描点和检测通道,以在同步定时产生检测图像,以使响应图像中的扫描部分之间的抖动最小化。

    Multi-spot scanning collection optics
    7.
    发明授权
    Multi-spot scanning collection optics 有权
    多点扫描采集光学元件

    公开(公告)号:US09546962B2

    公开(公告)日:2017-01-17

    申请号:US14619004

    申请日:2015-02-10

    Abstract: Disclosed are apparatus and methods for inspecting or measuring a specimen. A system comprises an illumination channel for generating and deflecting a plurality of incident beams to form a plurality of spots that scan across a segmented line comprised of a plurality of scan portions of the specimen. The system also includes one or more detection channels for sensing light emanating from a specimen in response to the incident beams directed towards such specimen and collecting a detected image for each scan portion as each incident beam's spot is scanned over its scan portion. The one or more detection channels include at least one longitudinal side channel for longitudinally collecting a detected image for each scan portion as each incident beam's spot is scanned over its scan portion.

    Abstract translation: 公开了用于检查或测量样本的装置和方法。 一种系统包括用于产生和偏转多个入射光束以形成多个斑点的照明通道,其跨越由样本的多个扫描部分组成的分割线扫描。 该系统还包括一个或多个检测通道,用于响应于朝向这种样本的入射光束,感测从样本发出的光,并且在每个入射光束的光点扫描其扫描部分时收集每个扫描部分的检测图像。 一个或多个检测通道包括至少一个纵向侧通道,用于纵向收集每个扫描部分的检测图像,因为每个入射光束的光斑在其扫描部分上扫描。

    System and Method for Oblique Incidence Scanning with 2D Array of Spots
    8.
    发明申请
    System and Method for Oblique Incidence Scanning with 2D Array of Spots 有权
    用2D阵列进行倾斜扫描的系统和方法

    公开(公告)号:US20160327493A1

    公开(公告)日:2016-11-10

    申请号:US14982747

    申请日:2015-12-29

    Abstract: A system to generate multiple beam lines in an oblique angle multi-beam spot scanning wafer inspection system includes a beam scanning device configured to scan a beam of illumination, an objective lens oriented at an oblique angle relative to the surface of a sample and with an optical axis perpendicular to a first scanning direction on the sample, and one or more optical elements positioned between the objective lens and the beam scanning device. The one or more optical elements split the beam into two or more offset beams such that the two or more offset beams are separated in a least a second direction perpendicular to the first direction. The one or more optical elements further modify the phase characteristics of the two or more offset beams such that the two or more offset beams are simultaneously in focus on the sample during a scan.

    Abstract translation: 在斜角多光束点扫描晶片检查系统中产生多个光束线的系统包括:束扫描装置,被配置为扫描照射束;物镜相对于样品的表面以倾斜角度定向;以及 垂直于样品上的第一扫描方向的光轴和位于物镜和束扫描装置之间的一个或多个光学元件。 一个或多个光学元件将光束分成两个或更多个偏移光束,使得两个或更多个偏移光束在垂直于第一方向的至少第二方向上分离。 一个或多个光学元件进一步修改两个或多个偏移光束的相位特性,使得两个或更多个偏移光束在扫描期间同时聚焦在样本上。

    IMAGE SYNCHRONIZATION OF SCANNING WAFER INSPECTION SYSTEM
    9.
    发明申请
    IMAGE SYNCHRONIZATION OF SCANNING WAFER INSPECTION SYSTEM 有权
    扫描波形检测系统的图像同步

    公开(公告)号:US20150170357A1

    公开(公告)日:2015-06-18

    申请号:US14634372

    申请日:2015-02-27

    CPC classification number: G06T7/0004 G01N21/9501

    Abstract: An inspection system comprises a beam generator module for deflecting spots across scan portions of a specimen. The system also includes detection channels for sensing light emanating from a specimen in response to an incident beam directed towards such specimen and generating a detected image for each scan portion. The system comprises a synchronization system comprising clock generator modules for generating timing signals for deflectors of the beam generator module to scan the spots across the scan portions at a specified frequency and each of the detection channels to generate the corresponding detected image at a specified sampling rate. The timing signals are generated based on a common system clock and cause the deflectors to scan the spots and the detection channels to generate a detected image at a synchronized timing so as to minimize jitter between the scan portions in the response image.

    Abstract translation: 检查系统包括用于偏转样本的扫描部分上的斑点的束发生器模块。 该系统还包括用于响应于朝向这种样本的入射光束感测从样本发出的光的检测通道,并且为每个扫描部分生成检测到的图像。 该系统包括同步系统,其包括用于产生用于波束发生器模块的偏转器的定时信号的时钟发生器模块,以扫描指定频率的扫描部分上的点和每个检测通道,以指定的采样率产生相应的检测图像 。 基于公共系统时钟生成定时信号,并且使得偏转器扫描点和检测通道,以在同步定时产生检测图像,以使响应图像中的扫描部分之间的抖动最小化。

    ENHANCED HIGH-SPEED LOGARITHMIC PHOTO-DETECTOR FOR SPOT SCANNING SYSTEM
    10.
    发明申请
    ENHANCED HIGH-SPEED LOGARITHMIC PHOTO-DETECTOR FOR SPOT SCANNING SYSTEM 有权
    用于点扫描系统的增强型高速对称光电探测器

    公开(公告)号:US20130169957A1

    公开(公告)日:2013-07-04

    申请号:US13675687

    申请日:2012-11-13

    Abstract: Disclosed are apparatus and methods for inspecting or measuring a specimen. An incident beam is directed across a plurality of consecutive scan portions of a specimen so that an output beam profile from each scan portion is consecutively collected by a photomultiplier tube (PMT), and the scan portions include at least one or more first scan portions and a next scan portion that is scanned after the one or more first scan portions. After or while the incident beam is directed to the one or more first scan portions of the specimen, an output signal for each first scan portion is obtained based on the output beam profile that is collected by the PMT for each first scan portion. An expected output beam profile for the next scan portion is determined based on the output signal that is obtained for each one or more first scan portions. As the incident beam is directed towards the next scan portion, a gain input to the PMT for the next scan portion is set based on the expected output beam profile so that the gain for such next scan portion results in a measured signal at the PMT that is within a predefined specification of the PMT or other hardware components that receive a measured signal from the PMT.

    Abstract translation: 公开了用于检查或测量样本的装置和方法。 入射光束穿过样本的多个连续的扫描部分,使得来自每个扫描部分的输出光束轮廓由光电倍增管(PMT)连续收集,并且扫描部分包括至少一个或多个第一扫描部分和 在所述一个或多个第一扫描部分之后被扫描的下一个扫描部分。 在入射光束被引导到样本的一个或多个第一扫描部分之后或之后,基于由PMT针对每个第一扫描部分收集的输出光束轮廓,获得每个第一扫描部分的输出信号。 基于对于每个一个或多个第一扫描部分获得的输出信号来确定用于下一扫描部分的预期输出光束轮廓。 当入射光束被引导到下一个扫描部分时,基于预期的输出光束分布来设置输入到下一个扫描部分的PMT的增益,使得这样的下一扫描部分的增益导致PMT处的测量信号, 在接收来自PMT的测量信号的PMT或其他硬件组件的预定义规范内。

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