发明申请
- 专利标题: Polishing Material Composition And Production Method Therefor
- 专利标题(中): 抛光材料组成及其制作方法
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申请号: US14406743申请日: 2013-06-10
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公开(公告)号: US20150174734A1公开(公告)日: 2015-06-25
- 发明人: Natsuki Ito , Atsushi Takahashi , Akihiro Maezawa
- 申请人: KONICA MINOLTA, INC.
- 申请人地址: JP Chiyoda
- 专利权人: KONICA MINOLTA, INC.
- 当前专利权人: KONICA MINOLTA, INC.
- 当前专利权人地址: JP Chiyoda
- 优先权: JP2012-133812 20120613
- 国际申请: PCT/JP2013/065944 WO 20130610
- 主分类号: B24D3/28
- IPC分类号: B24D3/28 ; B24D18/00
摘要:
An abrasive composition to be used in an abrasive material, including an inorganic abrasive particle. The particle comprises a shell layer being an outermost layer and mainly composed of cerium oxide; and an intermediate layer comprising cerium oxide and an oxide of at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and alkali earth metals and formed on an inner side of the shell layer. The abrasive composition also includes an organic base member comprising a polymerizable compound, wherein an outer surface of the organic base member is covered with the inorganic abrasive particle.