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公开(公告)号:US10011752B2
公开(公告)日:2018-07-03
申请号:US14426071
申请日:2013-09-03
申请人: KONICA MINOLTA, INC.
IPC分类号: C09K3/14
CPC分类号: C09K3/1445 , B22F1/02 , C01F17/0043 , C01P2004/03 , C01P2004/04 , C01P2004/32 , C01P2004/62 , C01P2004/64 , C01P2004/80 , C01P2004/84 , C23C18/1216
摘要: A production method for polishing-material particles, comprising: forming an inner layer having, as a main component thereof, a salt of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals; adding a prepared aqueous solution, at a prescribed time, to a reaction solution in which the salt formed from the element is dispersed, to form an outer layer on the outer side of the inner layer; using solid-liquid separation to separate a polishing-material-particle precursor from the reaction solution, and the polishing-material-particle precursor is baked; and the percentage of Ce in the reaction solution in which the surface of the outer layer is formed is in the range of 60-90 mol % inclusive.
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公开(公告)号:US09868885B2
公开(公告)日:2018-01-16
申请号:US14910986
申请日:2014-07-28
申请人: KONICA MINOLTA, INC.
发明人: Keisuke Mizoguchi , Akihiro Maezawa , Natsuki Ito , Atsushi Takahashi , Hideaki Wakamatsu , Yuuki Nagai , Chie Inui
CPC分类号: C09K3/1409 , B24C11/00 , C01F17/0043 , C01P2004/03 , C01P2004/32 , C01P2004/52 , C01P2004/54 , C01P2004/61 , C01P2004/62 , C01P2004/64 , C09G1/02 , C09K3/1463
摘要: Disclosed are polishing material particles which have polishing performance suitable for precision polishing and also have a high polishing speed and high monodispersibility; a polishing material containing the polishing material particles; and a polishing processing method using the polishing material. The polishing material particles are spherical particles having an average aspect ratio of 1.00 to 1.15, wherein the particle diameter (D50 (nm)) of the polishing material particles as determined from a particle diameter cumulative distribution curve falls within the range from 50 to 1500 nm. The average content of cerium or the total content of cerium and at least one element selected from lanthanum (La), praseodymium (Pr), neodymium (Nd), samarium (Sm) and europium (Eu) in the polishing material particles is 81 mol % or more relative to the total content of all of rare earth elements that constitute the polishing material particles.
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公开(公告)号:US09701878B2
公开(公告)日:2017-07-11
申请号:US14379046
申请日:2013-02-14
申请人: KONICA MINOLTA, INC.
发明人: Yuuki Nagai , Akihiro Maezawa , Atsushi Takahashi
IPC分类号: C09K3/14 , B24B57/02 , C02F11/14 , C02F103/12
CPC分类号: C09K3/1463 , B24B57/02 , C02F11/14 , C02F2103/12
摘要: Technique to provide an abrasive regeneration method which, from a used abrasive slurry, can recover an abrasive by an efficient method and can thereafter obtain a high-purity regenerated abrasive by a simple method. This abrasive regeneration method uses an abrasive comprising at least one type of abrasive selected from diamond, boron nitride, silicon carbide, alumina, alumina zirconia and zirconium oxide. The abrasive regeneration involves a slurry recovery step (A) for recovering an abrasive slurry discharged from a polishing machine, a separation and concentration step (B) for adding an alkaline earth metal salt as an inorganic salt to the recovered abrasive slurry to aggregate the abrasive, and separating and concentrating the abrasive from a mother liquor, and an abrasive recovery step (C) for recovering the separated and concentrated abrasive.
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公开(公告)号:US09629600B2
公开(公告)日:2017-04-25
申请号:US14551119
申请日:2014-11-24
申请人: Konica Minolta, Inc.
CPC分类号: A61B6/5217 , A61B6/4035 , A61B6/484 , A61B6/505 , G06T7/12 , G06T7/62 , G06T2207/10116 , G06T2207/30008
摘要: A medical imaging system includes an X-ray Talbot imaging apparatus and an image processing apparatus. The X-ray Talbot imaging apparatus includes a controller which generates reconstructed image(s) including at least a differential phase image from image signals of an imaged subject. The image processing apparatus measures the thickness of cartilage in the joint in the differential phase image or an image generated from the differential phase image, by reference to at least one of i) an edge of a bone in the joint identified in a reconstructed image or an image generated from the reconstructed image and ii) an edge of the cartilage identified in the differential phase image or the image generated from the differential phase image.
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公开(公告)号:US08955839B2
公开(公告)日:2015-02-17
申请号:US14083484
申请日:2013-11-19
发明人: Hiroshi Oyama , Kenji Izumiya , Kiyoto Kojima , Atsushi Takahashi
CPC分类号: B65H5/26 , B65H1/266 , B65H7/08 , B65H9/006 , B65H2402/10 , B65H2405/15 , B65H2405/332 , B65H2513/10 , B65H2513/42 , B65H2513/53 , B65H2801/06 , B65H2220/01 , B65H2220/02
摘要: A paper feed apparatus is capable of correcting the skew of a sheet irrespective of a differential conveyance distance. The paper feed apparatus is provided with a first large volume paper feed apparatus 100A having a control unit 130 which performs first correction control to correct the skew of a sheet by controlling a first conveyance unit 110 and forming a loop of the sheet P before a paper stop rollers 110d, and also performs second correction control to correct the skew of a sheet by controlling a second conveyance unit 120 and forming a loop of the sheet before a paper stop rollers 110d. In this case, the control unit 130 controls the first conveyance unit 110 and the second conveyance unit 120 in order that the skew correcting ability of the second correction control becomes greater than the skew correcting ability of the first correction control.
摘要翻译: 进纸装置能够校正纸张的歪斜,而与差分输送距离无关。 供纸装置设置有具有控制单元130的第一大容量供纸装置100A,该控制单元130通过控制第一传送单元110并且在纸张之前形成纸张P的环来执行第一校正控制以校正片材的歪斜 停止辊110d,并且还执行第二校正控制以通过控制第二输送单元120并在纸张停止辊110d之前形成纸张的环来校正纸张的歪斜。 在这种情况下,控制单元130控制第一输送单元110和第二输送单元120,以使得第二校正控制的偏斜校正能力变得大于第一校正控制的倾斜校正能力。
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公开(公告)号:US20150232728A1
公开(公告)日:2015-08-20
申请号:US14426071
申请日:2013-09-03
申请人: KONICA MINOLTA, INC.
IPC分类号: C09K3/14
CPC分类号: C09K3/1445 , B22F1/02 , C01F17/0043 , C01P2004/03 , C01P2004/04 , C01P2004/32 , C01P2004/62 , C01P2004/64 , C01P2004/80 , C01P2004/84 , C23C18/1216
摘要: A production method for polishing-material particles, comprising: forming an inner layer having, as a main component thereof, a salt of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals; adding a prepared aqueous solution, at a prescribed time, to a reaction solution in which the salt formed from the element is dispersed, to form an outer layer on the outer side of the inner layer; using solid-liquid separation to separate a polishing-material-particle precursor from the reaction solution, and the polishing-material-particle precursor is baked; and the percentage of Ce in the reaction solution in which the surface of the outer layer is formed is in the range of 60-90 mol% inclusive.
摘要翻译: 1.一种抛光材料粒子的制造方法,其特征在于,具有:形成作为主要成分的选自Al,Sc,Ti,V,Cr,Mn,Fe,Co,Ni中的至少一种元素的盐的内层, Cu,Zn,Ga,Ge,Zr,In,Sn,Y,Gd,Tb,Dy,Ho,Er,Tm,Yb,Lu,W,Bi,Th和碱土金属; 在规定时间将制得的水溶液加入到由元素形成的盐分散的反应溶液中,在内层的外侧形成外层; 使用固液分离将抛光材料颗粒前体与反应溶液分离,并抛光抛光材料 - 颗粒前体; 并且形成外层表面的反应溶液中的Ce的百分比在60-90摩尔%的范围内。
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公开(公告)号:US20150174734A1
公开(公告)日:2015-06-25
申请号:US14406743
申请日:2013-06-10
申请人: KONICA MINOLTA, INC.
发明人: Natsuki Ito , Atsushi Takahashi , Akihiro Maezawa
CPC分类号: B24D3/28 , B24D18/0072 , C09K3/1436 , C09K3/1463
摘要: An abrasive composition to be used in an abrasive material, including an inorganic abrasive particle. The particle comprises a shell layer being an outermost layer and mainly composed of cerium oxide; and an intermediate layer comprising cerium oxide and an oxide of at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and alkali earth metals and formed on an inner side of the shell layer. The abrasive composition also includes an organic base member comprising a polymerizable compound, wherein an outer surface of the organic base member is covered with the inorganic abrasive particle.
摘要翻译: 用于研磨材料的磨料组合物,包括无机磨料颗粒。 颗粒包括壳层,其主要由氧化铈组成的最外层; 以及包含氧化铈和选自Al,Sc,Ti,V,Cr,Mn,Fe,Co,Ni,Cu,Zn,Ga,Ge,Zr,In中的至少一种元素的氧化物的中间层 ,Sn,Y,Gd,Tb,Dy,Ho,Er,Tm,Yb,Lu,W,Bi,Th和碱土金属,形成在壳层的内侧。 磨料组合物还包括包含可聚合化合物的有机基底构件,其中有机基底构件的外表面被无机磨料颗粒覆盖。
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公开(公告)号:US11507007B2
公开(公告)日:2022-11-22
申请号:US17347178
申请日:2021-06-14
申请人: KONICA MINOLTA, INC.
IPC分类号: G03G15/00
摘要: A glossiness inspection device includes an illumination device that emits irradiation light to a glossiness detection target and a light receiving device that receives reflected light of the irradiation light reflected by the glossiness detection target and outputs a light reception detection signal according to an amount of the received light. A dimmer of the device adjusts an amount of the irradiation light, and a detection signal adjuster of the device adjusts a gain for amplifying the light reception detection signal. An irradiation position controller of the device selectively irradiates a first gloss region and a second gloss region of a correction plate with the irradiation light. A hardware processor of the device adjusts at least one of the amount of the irradiation light, an offset of the detection signal adjuster, a characteristic straight line for calculating a glossiness, or a calculated glossiness.
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公开(公告)号:US10047262B2
公开(公告)日:2018-08-14
申请号:US14901229
申请日:2014-06-18
申请人: Konica Minolta, Inc.
发明人: Keisuke Mizoguchi , Akihiro Maezawa , Atsushi Takahashi , Natsuki Ito , Natsumi Hirayama , Hideaki Wakamatsu
摘要: An object of the present invention is to provide a cerium oxide abrasive material containing cerium oxide abrasive particles prepared by a synthetic method using an aqueous solution of a salt of a rare earth element and a precipitant, the cerium oxide abrasive particles having a spherical shape and high polishing performance (polishing rate and polishing precision of the polished surface), a method for producing the cerium oxide abrasive material, and a polishing method. The cerium oxide abrasive material according to the present invention comprises spherical cerium oxide abrasive particles prepared by a synthetic method using an aqueous solution of a salt of a rare earth element and a precipitant, wherein the cerium oxide abrasive particles have a spherical shape having an average aspect ratio within the range of 1.00 to 1.15.
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公开(公告)号:US10017675B2
公开(公告)日:2018-07-10
申请号:US14367154
申请日:2012-12-17
申请人: KONICA MINOLTA, INC.
发明人: Atsushi Takahashi , Yuuki Nagai , Akihiro Maezawa
CPC分类号: C09K3/1409 , B01D11/0246 , B01D21/02 , B01D2221/14 , B24B57/02 , B28D5/007 , C02F1/5209 , C02F1/5236 , C09K3/14 , Y02P70/179
摘要: Method for separating a polishing material, which is capable of separating and recovering cerium oxide from a used polishing material that is mainly composed of cerium oxide and a regenerated polishing material which can be obtained by the separation method. This method for separating a polishing material is characterized in that a divalent alkaline earth metal salt is added into the slurry of the used polishing material, while controlling the temperature of the slurry within the range of 10-70 DEG C., thereby causing the polishing material to aggregate under such conditions that the mother liquor has a pH of less than 10.0 as the pH is converted to one at 25 DEG C. so that the polishing material is separated from the mother liquor.
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