发明申请
- 专利标题: PHOTO-ALIGNMENT EXPOSURE DEVICE AND PHOTO-ALIGNMENT EXPOSURE METHOD
- 专利标题(中): 照相曝光装置和照相机曝光方法
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申请号: US14412917申请日: 2013-03-29
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公开(公告)号: US20150177568A1公开(公告)日: 2015-06-25
- 发明人: Koichi Kajiyama , Kazushige Hashimoto , Toshinari Arai
- 申请人: V TECHNOLOGY CO., LTD.
- 优先权: JP2012-151630 20120705
- 国际申请: PCT/JP2013/059577 WO 20130329
- 主分类号: G02F1/1337
- IPC分类号: G02F1/1337 ; G02F1/13
摘要:
A photo-alignment exposure device that includes a first mask and a first exposure device that independently proximity-exposes a first divided area, a second mask and a second exposure device that independently proximity-exposes a second divided area adjacent to the first divided area, and a third mask and a third exposure device that exposes an area on a side of the first divided area near a boundary between the first divided area and the second divided area. The third exposure device is provided with a photo-irradiation angle same as that of the first exposure device or the second exposure device with respect to an exposed surface. A condensing element that condenses the mask transmitted light on the area on a side of the first divided area near the boundary is provided between the mask opening of the third mask and the exposed surface.
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