Invention Application
- Patent Title: Catalytic Growth of Josephson Junction Tunnel Barrier
- Patent Title (中): 约瑟夫森结隧道屏障的催化生长
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Application No.: US14137640Application Date: 2013-12-20
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Publication No.: US20150179916A1Publication Date: 2015-06-25
- Inventor: Dipankar Pramanik , Frank Greer , Andrew Steinbach
- Applicant: Intermolecular, Inc.
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L39/24
- IPC: H01L39/24 ; C23C14/08 ; H01L39/22 ; C23C16/455 ; C23C14/34
Abstract:
A tunnel barrier layer in a superconducting device, such as a Josephson junction, is made from catalytically grown silicon dioxide at a low temperature (
Public/Granted literature
- US09082927B1 Catalytic growth of Josephson junction tunnel barrier Public/Granted day:2015-07-14
Information query
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