发明申请
US20150184047A1 METHOD FOR MODIFYING SUBSTRATE SURFACE, MODIFYING FILM AND COATING SOLUTION USED FOR MODIFICATION OF SUBSTRATE SURFACE
审中-公开
用于修改基板表面的方法,用于修改基板表面的改性膜和涂层溶液
- 专利标题: METHOD FOR MODIFYING SUBSTRATE SURFACE, MODIFYING FILM AND COATING SOLUTION USED FOR MODIFICATION OF SUBSTRATE SURFACE
- 专利标题(中): 用于修改基板表面的方法,用于修改基板表面的改性膜和涂层溶液
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申请号: US14423651申请日: 2013-08-27
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公开(公告)号: US20150184047A1公开(公告)日: 2015-07-02
- 发明人: Mai Sugawara , Akira Kumazawa , Shigeru Yokoi
- 申请人: Tokyo Ohka Kogyo Co., Ltd.
- 优先权: JP2012-190291 20120830; JP2013-166771 20130809
- 国际申请: PCT/JP2013/072923 WO 20130827
- 主分类号: C09K3/18
- IPC分类号: C09K3/18 ; B05D5/08
摘要:
A method for modifying a substrate surface using a silylating agent that is capable of successfully modifying the substrate surface regardless of the substrate material; a modifying film which successfully adheres to a substrate surface regardless of the material of the substrate and provides a substrate that is surface-modified to a desired extent; and a coating solution which is capable of forming a coating film on a substrate surface. A silane compound layer is formed on the surface of the coating film by a silylating agent and is firmly affixed thereto. The surface of a substrate is treated with a metal compound that is capable of producing a hydroxyl group by hydrolysis. The substrate surface which has been treated with the metal compound is then treated with a silylating agent.
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