Invention Application
- Patent Title: THIN FILM TRANSISTOR ARRAY PANEL
- Patent Title (中): 薄膜晶体管阵列
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Application No.: US14585336Application Date: 2014-12-30
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Publication No.: US20150187811A1Publication Date: 2015-07-02
- Inventor: Daisuke INOUE , Mi Suk KIM , Si Heun KIM , Tae Ho KIM , So Youn PARK , Keun Chan OH , Chang-Hun LEE
- Applicant: Samsung Display Co., Ltd.
- Priority: KR10-2013-0169354 20131231
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/51 ; H01L29/417 ; H01L29/49

Abstract:
A thin film transistor array panel includes an insulation substrate; a gate line and a first electrode on the insulation substrate; a gate insulating layer on the gate line and the first electrode; a data line on the gate insulating layer; a passivation layer on the gate insulating layer and the data line; and a second electrode on the passivation layer. Relative permittivity (ε) of the gate insulating layer is more than about 15, and a thickness of the gate insulating layer is about 2000 angstroms.
Public/Granted literature
- US09559127B2 Thin film transistor array panel Public/Granted day:2017-01-31
Information query
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