发明申请
US20150188290A1 INTERBAND CASCADE LASERS WITH ENGINEERED CARRIER DENSITIES
有权
INTERBAND CASCADE激光与工程承运人密度
- 专利标题: INTERBAND CASCADE LASERS WITH ENGINEERED CARRIER DENSITIES
- 专利标题(中): INTERBAND CASCADE激光与工程承运人密度
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申请号: US14308768申请日: 2014-06-19
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公开(公告)号: US20150188290A1公开(公告)日: 2015-07-02
- 发明人: Igor Vurgaftman , Jerry R. Meyer , Chadwick Lawrence Canedy , William W. Bewley , Chul Soo Kim , Mijin Kim , Charles D. Merritt
- 申请人: Igor Vurgaftman , Jerry R. Meyer , Chadwick Lawrence Canedy , William W. Bewley , Chul Soo Kim , Mijin Kim , Charles D. Merritt
- 申请人地址: US DC Washington
- 专利权人: The Government of the United States of America, as represented by the Secretary of the Navy
- 当前专利权人: The Government of the United States of America, as represented by the Secretary of the Navy
- 当前专利权人地址: US DC Washington
- 主分类号: H01S5/34
- IPC分类号: H01S5/34 ; H01S5/343
摘要:
Methods for improving the performance of type-II and type-I ICLs, particularly in the mid-IR wavelength range, are provided. The electron injector of a type-II or a type-I ICL can be heavily n-doped to increase the ratio of electrons to holes in the active quantum wells, thereby increasing the probability of radiative recombination in the active quantum wells and reducing the threshold current density Jth needed to achieve lasing. For both type-II and type-I ICLs, the doping should have a sheet density in the low-1012 range. In either the type-II or the type-I case, in some embodiments, heavy doping can be concentrated in the middle quantum wells of the electron injector, while in other embodiments, doping with silicon can be shifted towards the active quantum wells.
公开/授权文献
- US09059570B1 Interband cascade lasers with engineered carrier densities 公开/授权日:2015-06-16
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