发明申请
- 专利标题: METHOD OF MANUFACTURING CONDUCTIVE FILM AND COMPOSITION FOR FORMING CONDUCTIVE FILM
- 专利标题(中): 导电膜的制造方法和导电膜的组成
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申请号: US14665435申请日: 2015-03-23
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公开(公告)号: US20150194235A1公开(公告)日: 2015-07-09
- 发明人: Toshihiro KARIYA , Hiroshi OHTA
- 申请人: FUJIFILM Corporation
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM CORPORATION
- 当前专利权人: FUJIFILM CORPORATION
- 当前专利权人地址: JP Tokyo
- 优先权: JP2012-212631 20120926
- 主分类号: H01B1/22
- IPC分类号: H01B1/22 ; H01B13/00
摘要:
A conductive film manufacturing method includes a coating formation step of forming a coating by applying onto a thermoplastic resin substrate a conductive film-forming composition including copper oxide particles (A), copper particles (B), and an organic polymer (C), a ratio of a copper particle (B) content to a copper oxide particle (A) content as expressed by B/A being 10 to 50 wt %, and a reduction step of reducing the copper oxide particles (A) through irradiation of the coating with pulsed light, thereby forming a copper-containing conductive film. The conductive film obtained by irradiation with pulsed light according to this method has good adhesion to the thermoplastic resin substrate.
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