Provided is a method for producing a surface treated base including a process of preparing a masking solution by heating a masking agent including paraffin to a temperature more than the melting point of the paraffin, a process of patterning the masking solution on a substrate to form a mask pattern, a process of surface treating the substrate having the mask pattern and a process of producing the surface treated base by removing the masking agent constituting the mask pattern using a refrigerant having a temperature less than the melting point of the paraffin. The masking agent is readily removed without adversely affecting the formed pattern after surface treatment.