发明申请
- 专利标题: PHOTOCATALYST INJECTION METHOD AND PHOTOCATALYST INJECTION SYSTEM
- 专利标题(中): 光电子注射方法和光电子注入系统
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申请号: US14432547申请日: 2013-10-01
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公开(公告)号: US20150243387A1公开(公告)日: 2015-08-27
- 发明人: Masato Okamura , Osamu Shibasaki , Koji Negishi , Seiji Yamamoto , Hiroyuki Arai , Yutaka Uruma
- 申请人: KABUSHIKI KAISHA TOSHIBA
- 申请人地址: JP Minato-ku, Tokyo
- 专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人: KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址: JP Minato-ku, Tokyo
- 优先权: JP2012-221576 20121003
- 国际申请: PCT/JP2013/076714 WO 20131001
- 主分类号: G21C19/307
- IPC分类号: G21C19/307 ; B01J19/12 ; C23F11/18
摘要:
A photocatalyst injection system including: a reactor primary system coolant collection section collecting a reactor primary system coolant containing a noble metal or noble metal ion from a reactor primary system; a photocatalyst addition section adding a photocatalyst to the collected reactor primary system coolant; an ultraviolet irradiation section irradiating, with ultraviolet rays, the coolant to which the photocatalyst has been added for producing, in the coolant, a noble metal-carrying photocatalyst in which the noble metal is carried on a surface of the photocatalyst; and a noble metal-carrying photocatalyst injection section injecting the coolant containing the noble metal-carrying photocatalyst into the reactor primary system.