发明申请
- 专利标题: HIGH FREQUENCY MATCHING SYSTEM
- 专利标题(中): 高频匹配系统
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申请号: US14707293申请日: 2015-05-08
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公开(公告)号: US20150244342A1公开(公告)日: 2015-08-27
- 发明人: Takashi SHIMOMOTO , Koji ITADANI , Masakatsu MITO
- 申请人: DAIHEN Corporation
- 优先权: JP2012-218702 20120928
- 主分类号: H03H7/40
- IPC分类号: H03H7/40
摘要:
An impedance adjustment apparatus of the invention performs impedance matching using characteristic parameters, even where a high frequency power source of variable frequencies is used. The apparatus is applicable to a power supply system using a high frequency power source of variable frequencies. Characteristic parameters obtained by targeting a portion of combinations of position information (C) of a variable capacitor and output frequency information (F) of the power source are stored in a memory. A T-parameter acquisition unit acquires characteristic parameters corresponding to (Cnow, Fnow) at the current time. An output reflection coefficient calculation unit calculates a reflection coefficient of an output end. A target information specifying unit, based on the above information and a target input reflection coefficient, specifies target combination information in which a reflection coefficient of an output end approaches the target input reflection coefficient. Impedance matching is performed based on this information.
公开/授权文献
- US09270250B2 High frequency matching system 公开/授权日:2016-02-23
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