Invention Application
US20150248944A1 ABERRATION CORRECTOR AND CHARGED PARTICLE BEAM APPARATUS USING THE SAME
有权
使用相同的ABERRATION CORRECTOR和充电颗粒光束装置
- Patent Title: ABERRATION CORRECTOR AND CHARGED PARTICLE BEAM APPARATUS USING THE SAME
- Patent Title (中): 使用相同的ABERRATION CORRECTOR和充电颗粒光束装置
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Application No.: US14607736Application Date: 2015-01-28
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Publication No.: US20150248944A1Publication Date: 2015-09-03
- Inventor: Zhaohui Cheng , Hideo Kashima , Hiroaki Baba , Takeyoshi Ohashi , Tomonori Nakano , Kotoko Urano , Naomasa Suzuki
- Applicant: Hitachi High-Technologies Corporation
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Priority: JP2014-037630 20140228
- Main IPC: G21K1/093
- IPC: G21K1/093 ; H01J37/153

Abstract:
Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.
Public/Granted literature
- US09287084B2 Aberration corrector and charged particle beam apparatus using the same Public/Granted day:2016-03-15
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