发明申请
US20150270478A1 THERMALLY ASSISTED MRAM WITH INCREASED BREAKDOWN VOLTAGE USING A DOUBLE TUNNEL BARRIER 有权
使用双重隧道式障碍物,增加了断电电压的MRAM

THERMALLY ASSISTED MRAM WITH INCREASED BREAKDOWN VOLTAGE USING A DOUBLE TUNNEL BARRIER
摘要:
A mechanism is provided for a thermally assisted magnetoresistive random access memory device (TAS-MRAM). A non-magnetic heating structure is formed of a barrier seed layer disposed on a buffer layer. A non-magnetic tunnel barrier is disposed on the barrier seed layer. A barrier cap layer is disposed on the non-magnetic tunnel barrier. A top buffer layer is disposed on the barrier cap layer. An antiferromagnetic layer is disposed on the top buffer layer of the non-magnetic heating structure. A magnetic tunnel junction is disposed on the antiferromagnetic layer. The magnetic tunnel junction includes a ferromagnetic storage layer disposed on the antiferromagnetic layer, a non-magnetic active tunnel barrier disposed on the ferromagnetic storage layer, and a ferromagnetic sense layer disposed on the non-magnetic active tunnel barrier.
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