发明申请
US20150270478A1 THERMALLY ASSISTED MRAM WITH INCREASED BREAKDOWN VOLTAGE USING A DOUBLE TUNNEL BARRIER
有权
使用双重隧道式障碍物,增加了断电电压的MRAM
- 专利标题: THERMALLY ASSISTED MRAM WITH INCREASED BREAKDOWN VOLTAGE USING A DOUBLE TUNNEL BARRIER
- 专利标题(中): 使用双重隧道式障碍物,增加了断电电压的MRAM
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申请号: US14217999申请日: 2014-03-18
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公开(公告)号: US20150270478A1公开(公告)日: 2015-09-24
- 发明人: Anthony J. Annunziata , Philip L. Trouilloud , Daniel C. Worledge
- 申请人: International Business Machines Corporation
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L43/02
- IPC分类号: H01L43/02 ; H01L43/12
摘要:
A mechanism is provided for a thermally assisted magnetoresistive random access memory device (TAS-MRAM). A non-magnetic heating structure is formed of a barrier seed layer disposed on a buffer layer. A non-magnetic tunnel barrier is disposed on the barrier seed layer. A barrier cap layer is disposed on the non-magnetic tunnel barrier. A top buffer layer is disposed on the barrier cap layer. An antiferromagnetic layer is disposed on the top buffer layer of the non-magnetic heating structure. A magnetic tunnel junction is disposed on the antiferromagnetic layer. The magnetic tunnel junction includes a ferromagnetic storage layer disposed on the antiferromagnetic layer, a non-magnetic active tunnel barrier disposed on the ferromagnetic storage layer, and a ferromagnetic sense layer disposed on the non-magnetic active tunnel barrier.
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