发明申请
US20150270486A1 MASK FOR FORMING ORGANIC LAYER PATTERN, FORMING METHOD OF ORGANIC LAYER PATTERN, AND MANUFACTURING METHOD OF ORGANIC LIGHT EMITTING DIODE DISPLAY USING THE SAME
有权
用于形成有机层模式的掩模，有机层模式的形成方法和使用其的有机发光二极管显示的制造方法
- 专利标题： MASK FOR FORMING ORGANIC LAYER PATTERN, FORMING METHOD OF ORGANIC LAYER PATTERN, AND MANUFACTURING METHOD OF ORGANIC LIGHT EMITTING DIODE DISPLAY USING THE SAME
- 专利标题（中）： 用于形成有机层模式的掩模，有机层模式的形成方法和使用其的有机发光二极管显示的制造方法
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申请号： US14532993申请日： 2014-11-04
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公开(公告)号： US20150270486A1公开(公告)日： 2015-09-24
- 发明人: Hyun Sung Bang , Jae Sik Kim , Yeon Hwa Lee , Joon Gu Lee , Ji Young Choung , Jin Baek Choi , Kyu Hwan Hwang , Young Woo Song
- 申请人： Samsung Display Co., Ltd.
- 优先权： KR10-2014-0031857 20140318
- 主分类号： H01L51/00
- IPC分类号： H01L51/00 ; H01L51/52 ; H01L51/56 ; G03F1/52 ; G03F7/20
摘要：
A mask for forming an organic layer pattern, the mask including a photomask having a first substrate and a reflecting layer on the first substrate; and a donor substrate on the photomask and separated therefrom, the donor substrate including a second substrate and an absorption part on the second substrate, wherein the photomask comprises a reflecting part configured to reflect light incident to the photomask and a light concentrating part configured to concentrate the light and transmit the light to the donor substrate.
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