Invention Application
- Patent Title: POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
- Patent Title (中): 抛光垫与基础层和抛光表面层
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Application No.: US14736568Application Date: 2015-06-11
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Publication No.: US20150273656A1Publication Date: 2015-10-01
- Inventor: William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
- Applicant: William C. Allison , Diane Scott , Paul Andre Lefevre , James P. LaCasse , Alexander William Simpson
- Main IPC: B24B37/24
- IPC: B24B37/24 ; B24B37/22 ; B24B37/26 ; B24B37/20
Abstract:
Polishing pads with foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer. A polishing surface layer is bonded to the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a foundation layer are also described.
Information query
