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    Polishing pad having porogens with liquid filler
    2.
    发明授权
    Polishing pad having porogens with liquid filler 有权
    抛光垫具有带有液体填料的致孔剂

    公开(公告)号：US09238294B2

    公开(公告)日：2016-01-19

    申请号：US14307846

    申请日：2014-06-18

    申请人： Paul Andre Lefevre ,  William C. Allison

    发明人： Paul Andre Lefevre ,  William C. Allison

    IPC分类号： B24B37/20 ,  B24B37/24 ,  B24B37/26 ,  B24D3/32

    CPC分类号： B24B37/24 ,  B24B37/205 ,  B24B37/26 ,  B24D3/32

    摘要： Polishing pads having porogens with liquid filler and methods of fabricating polishing pads having porogens with liquid filler are described. In an example, a polishing pad for polishing a substrate includes a polishing body having a polymer matrix and a plurality of porogens dispersed throughout the polymer matrix. Each of the plurality of porogens has a shell with a liquid filler. The liquid filler has a boiling point less than 100 degrees Celsius at a pressure of 1 atm, a density less than water, or both.

    摘要翻译： 描述了具有带有液体填料的致孔剂的抛光垫和用液体填料制造具有致孔剂的抛光垫的方法。 在一个实例中，用于抛光衬底的抛光垫包括具有分散在整个聚合物基体中的聚合物基质和多个致孔剂的抛光体。 多个致孔剂中的每一个具有带有液体填料的壳。 液体填充剂的沸点低于100摄氏度，压力为1个大气压，密度小于水或两者。

    Polishing pad with grooved foundation layer and polishing surface layer
    3.
    发明授权
    Polishing pad with grooved foundation layer and polishing surface layer 有权
    抛光垫带有凹槽基础层和抛光表面层

    公开(公告)号：US09067298B2

    公开(公告)日：2015-06-30

    申请号：US13306849

    申请日：2011-11-29

    申请人： Paul Andre Lefevre ,  William C. Allison ,  Diane Scott ,  James P. LaCasse

    发明人： Paul Andre Lefevre ,  William C. Allison ,  Diane Scott ,  James P. LaCasse

    IPC分类号： B24B37/16 ,  B24B37/24 ,  B24B37/26

    CPC分类号： B24B37/26 ,  B24B37/16 ,  B24B37/205 ,  B24B37/22 ,  B24B37/24 ,  B24D18/00

    摘要： Polishing pads with grooved foundation layers and polishing surface layers are described. In an example, a polishing pad for polishing a substrate includes a foundation layer having a pattern of grooves disposed therein. A continuous polishing surface layer is attached to the pattern of grooves of the foundation layer. In another example, a polishing pad for polishing a substrate includes a foundation layer with a surface having a pattern of protrusions disposed thereon. Each protrusion has a top surface and sidewalls. A non-continuous polishing surface layer is attached to the foundation layer and includes discrete portions. Each discrete portion is attached to the top surface of a corresponding one of the protrusions of the foundation layer. Methods of fabricating polishing pads with a polishing surface layer bonded to a grooved foundation layer are also described.

    摘要翻译： 描述具有开槽基础层和抛光表面层的抛光垫。 在一个示例中，用于抛光衬底的抛光垫包括其中布置有凹槽图案的基础层。 连续的抛光表面层附着到基础层的凹槽的图案上。 在另一个实例中，用于抛光衬底的抛光垫包括具有设置在其上的突起图案的表面的基础层。 每个突起具有顶表面和侧壁。 不连续的抛光表面层附着到基础层上并且包括离散的部分。 每个离散部分附接到基础层的相应的一个突起的顶表面。 还描述了制造具有与沟槽基础层结合的抛光表面层的抛光垫的方法。

    COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING
    4.
    发明申请
    COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING 审中-公开
    用于化学机械抛光的涂覆压缩SUBPAD

    公开(公告)号：US20160144477A1

    公开(公告)日：2016-05-26

    申请号：US14635973

    申请日：2015-03-02

    申请人： Diane Scott ,  Paul Andre Lefevre

    发明人： Diane Scott ,  Paul Andre Lefevre

    IPC分类号： B24B37/22 ,  B24D18/00 ,  B24B37/24

    CPC分类号： B24B37/22 ,  B24B37/24 ,  B24D18/0072

    摘要： Coated compressive subpads for polishing pad stacks and methods of fabricating coated compressive subpads for polishing pad stacks are described. In an example, a polishing pad stack for polishing a substrate includes a polishing pad having a polishing surface and a back surface. The polishing pad stack also includes a compressive subpad with a first surface having a first pressure sensitive adhesive layer coated thereon. The first surface of the compressive subpad is coupled directly to the back surface of the polishing pad by the first pressure sensitive adhesive layer.

    摘要翻译： 描述了用于抛光垫堆叠的涂覆压缩子垫和制造用于抛光垫堆叠的涂覆压缩子垫的方法。 在一个实例中，用于抛光衬底的抛光垫叠层包括具有抛光表面和背面的抛光垫。 抛光垫堆叠还包括具有第一表面的压缩子垫，其具有涂覆在其上的第一压敏粘合剂层。 压缩子垫的第一表面通过第一压敏粘合剂层直接连接到抛光垫的后表面。

    POLISHING PAD HAVING POROGENS WITH LIQUID FILLER
    9.
    发明申请
    POLISHING PAD HAVING POROGENS WITH LIQUID FILLER 有权
    具有液体填料的抛光垫

    公开(公告)号：US20150367478A1

    公开(公告)日：2015-12-24

    申请号：US14307846

    申请日：2014-06-18

    申请人： Paul Andre Lefevre ,  William C. Allison

    发明人： Paul Andre Lefevre ,  William C. Allison

    IPC分类号： B24B37/24 ,  B24B37/26 ,  B24D3/32 ,  B24B37/20

    CPC分类号： B24B37/24 ,  B24B37/205 ,  B24B37/26 ,  B24D3/32

    摘要： Polishing pads having porogens with liquid filler and methods of fabricating polishing pads having porogens with liquid filler are described. In an example, a polishing pad for polishing a substrate includes a polishing body having a polymer matrix and a plurality of porogens dispersed throughout the polymer matrix. Each of the plurality of porogens has a shell with a liquid filler. The liquid filler has a boiling point less than 100 degrees Celsius at a pressure of 1 atm, a density less than water, or both.

    摘要翻译： 描述了具有带有液体填料的致孔剂的抛光垫和用液体填料制造具有致孔剂的抛光垫的方法。 在一个实例中，用于抛光衬底的抛光垫包括具有分散在整个聚合物基体中的聚合物基质和多个致孔剂的抛光体。 多个致孔剂中的每一个具有带有液体填料的壳。 液体填充剂的沸点低于100摄氏度，压力为1个大气压，密度小于水或两者。