Invention Application
- Patent Title: Method and System for Reducing Curtaining in Charged Particle Beam Sample Preparation
- Patent Title (中): 降低带电粒子束样品制备的方法和系统
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Application No.: US14432711Application Date: 2013-10-07
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Publication No.: US20150276567A1Publication Date: 2015-10-01
- Inventor: Michael Schmidt , Hyun Hwa Kim , Sang Hoon Lee , Stacey Stone , Jeffrey Blackwood
- Applicant: FEI COMPANY
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- International Application: PCT/US2013/063640 WO 20131007
- Main IPC: G01N1/32
- IPC: G01N1/32 ; H01J37/305 ; H01J37/20
Abstract:
A method and system for exposing a portion of a structure in a sample for observation in a charged particle beam system, including extracting a sample from a bulk sample; determining an orientation of the sample that reduces curtaining; mounting the sample to a holder in the charged particle beam system so that the holder orients the sample in an orientation that reduces curtaining when the sample is milled to expose the structure; exposing the structure by milling the sample in a direction that reduces curtaining; and imaging the structure.
Public/Granted literature
- US09488554B2 Method and system for reducing curtaining in charged particle beam sample preparation Public/Granted day:2016-11-08
Information query
