发明申请
- 专利标题: NANO-RING GATE ELECTRODE NANOCHANNELS
- 专利标题(中): 纳米门电极纳米通道
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申请号: US14695390申请日: 2015-04-24
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公开(公告)号: US20150276665A1公开(公告)日: 2015-10-01
- 发明人: Binquan Luan , Sung-wook Nam
- 申请人: International Business Machines Corporation
- 主分类号: G01N27/414
- IPC分类号: G01N27/414 ; C12Q1/68
摘要:
A technique includes providing a nanodevice. A gate electrode structure has nanochannels with a first end connected to a first common trench and a second end connected to a second common trench. A gate electrode extends laterally as a continuous line on the gate electrode structure and is formed in each of the nanochannels. The gate electrode forms a separate nano-ring electrode around a partial circumference inside each of the nanochannels. The gate electrode is parallel to the first and second common trenches and is perpendicular to the nanochannels.
公开/授权文献
- US09285337B2 Nano-ring gate electrode nanochannels 公开/授权日:2016-03-15