The invention relates to a method for producing at least one layer (1) on a surface area (2) of an optoelectronic component (100, 101, 102, 103, 104, 105) comprising a functional layer sequence (41) with an active area which is suitable to produce or to detect the light when the optoelectronic component is in operation. Said method consists of the following steps: introducing the surface area (2) into a coating chamber (10); depositing the at least one layer (1) according to a flash-light supported atomic layer deposition method in which the surface area (2) is exposed to at least one gaseous first initial material (21) or at least one gaseous first initial material (21) and subsequently a gaseous second initial material (22) to form the at least one layer (1), and molecules of the first and/or second initial material (21, 22), which are absorbed on the surface area, are exposed to at least one flash of light, the molecules absorbed on the surface area being split.