发明申请
- 专利标题： POLISHING PAD CONDITIONING SYSTEM INCLUDING SUCTION
- 专利标题（中）： 抛光垫调节系统，包括吸收
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申请号： US14266543申请日： 2014-04-30
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公开(公告)号： US20150314417A1公开(公告)日： 2015-11-05
- 发明人: Lizhong Sun , Byung-Sung Leo Kwak
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： B24B53/017
- IPC分类号： B24B53/017 ; B24B53/007 ; B24B55/06
摘要：
A system for use in substrate polishing includes a conditioner system for conditioning a surface of a polishing pad and a vacuum system having a vacuum port. The conditioner system includes a conditioner head constructed to receive an abrasive conditioner component. The vacuum system is configured to apply suction through the vacuum port to the surface of the polishing pad in a direction away from the surface to remove material on the surface.
公开/授权文献
- US09375825B2 Polishing pad conditioning system including suction 公开/授权日：2016-06-28
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