Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Patent Title (中): LITHOGRAPHIC装置和装置制造方法
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Application No.: US14800493Application Date: 2015-07-15
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Publication No.: US20150316858A1Publication Date: 2015-11-05
- Inventor: Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
Public/Granted literature
- US10338478B2 Lithographic apparatus and device manufacturing method Public/Granted day:2019-07-02
Information query
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