Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS, SUBSTRATE SUPPORT SYSTEM, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM
- Patent Title (中): 平面设备,基板支撑系统,装置制造方法和控制程序
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Application No.: US14647778Application Date: 2013-11-25
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Publication No.: US20150316860A1Publication Date: 2015-11-05
- Inventor: Marinus Maria Johannes VAN DE WAL , Wilhelmus Henricus Theodorus Maria AANGENENT , Ramidin Izair KAMIDI , Khalid MANSSOURI
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- International Application: PCT/EP2013/074613 WO 20131125
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A lithographic apparatus includes a driven object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein the plurality of actuators are over-determined in an actuator degree of freedom; a control system including a transformation matrix configured to generate controller output signals for each of the plurality of actuators in response to a setpoint, wherein the transformation matrix is configured such that the controller output signals do not excite the compliant dynamics of the driven object in at least one degree of freedom.
Public/Granted literature
- US09715182B2 Lithographic apparatus, substrate support system, device manufacturing method and control program Public/Granted day:2017-07-25
Information query
IPC分类: