公开(公告)号：US20220299889A1

公开(公告)日：2022-09-22

申请号：US17636765

申请日：2020-07-24

Applicant: ASML Netherlands B.V.

Inventor： Thijs Adriaan Cornelis VAN KEULEN ,  Hendrikus COX ,  Ramidin Izair KAMIDI ,  Willem Herman Gertruda Anna KOENEN

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/68

Abstract: A method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus. Generating a measurement signal representing a position of the first object relative to the second object, at an initial relative position. Determining a gradient associated with the initial relative position, based on the measurement signal. Determining a position set point based on the gradient and wherein the position set point comprises a three-dimensional dither signal. Controlling the position of the first object relative to the second object to a further relative position, based on the position set point.

公开(公告)号：US20170199468A1

公开(公告)日：2017-07-13

申请号：US15314440

申请日：2015-05-01

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Wilhelmus Henricus Theodorus Maria AANGENENT ,  Nic Jasper DIRKX ,  Ramidin Izair KAMIDI ,  Wilhelmus Franciscus Johannes SIMONS

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F9/7088 ,  G03F9/7092

Abstract: An object positioning system including a movable object, an actuator system and a control system. The moveable object is moveable relative to a reference. The actuator system is configured to apply a force to the object at a force application location on the object in order to move the moveable object relative to the reference. The control system is configured to position a point of interest of the object relative to the reference. The control system is configured to drive the actuator system based on a parameter representing a spatial relationship between the force application location and the point of interest. The parameter is dependent on a further parameter representing a position of the object relative to the reference.

公开(公告)号：US20160252827A1

公开(公告)日：2016-09-01

申请号：US15028676

申请日：2014-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans BUTLER ,  Ramidin Izair KAMIDI ,  Yanin KASEMSINSUP

IPC: G03F7/20 ,  G01B11/00 ,  G01B9/02

CPC classification number: G03F7/70775 ,  G01B9/02 ,  G01B11/002 ,  G03F7/70725

Abstract: An object positioning system includes an object; a measurement system to measure the position of the object, wherein each sensor of the measurement system has an associated measurement area on the object and wherein a location of at least one measurement area on the object is dependent on the position of the object; an actuator system to position the object; a control system configured to drive the actuator system, wherein the control system includes an observer with a dynamic model of the object to estimate an internal dynamic behavior of the object, wherein the dynamic model includes the dependency of the location of at least one measurement area on the position of the object, and wherein the control system is configured to drive the actuator system in dependency of an output of the observer.

Abstract translation: 物体定位系统包括物体; 用于测量所述物体的位置的测量系统，其中所述测量系统的每个传感器在所述物体上具有相关联的测量区域，并且其中所述物体上的至少一个测量区域的位置取决于所述物体的位置; 用于定位物体的致动器系统; 配置成驱动所述致动器系统的控制系统，其中所述控制系统包括具有所述物体的动态模型的观察者以估计所述物体的内部动态行为，其中所述动态模型包括至少一个测量区域的位置的依赖性 在所述对象的位置上，并且其中所述控制系统被配置为依照所述观察者的输出来驱动所述致动器系统。

公开(公告)号：US20150316860A1

公开(公告)日：2015-11-05

申请号：US14647778

申请日：2013-11-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Marinus Maria Johannes VAN DE WAL ,  Wilhelmus Henricus Theodorus Maria AANGENENT ,  Ramidin Izair KAMIDI ,  Khalid MANSSOURI

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70758 ,  G03F7/70783

Abstract: A lithographic apparatus includes a driven object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein the plurality of actuators are over-determined in an actuator degree of freedom; a control system including a transformation matrix configured to generate controller output signals for each of the plurality of actuators in response to a setpoint, wherein the transformation matrix is configured such that the controller output signals do not excite the compliant dynamics of the driven object in at least one degree of freedom.

Abstract translation: 光刻设备包括具有顺应动力学的被驱动物体; 多个致动器，被配置为作用在从动对象上，其中所述多个致动器在致动器的自由度中被过度确定; 控制系统，包括变换矩阵，其被配置为响应于设定点为所述多个致动器中的每一个生成控制器输出信号，其中所述变换矩阵被配置为使得所述控制器输出信号不激发所述被驱动对象的顺应动态 至少一个自由度。