Invention Application
US20150320495A1 MANAGEMENT OF VOLTAGE STANDING WAVE RATIO AT SKIN SURFACE DURING MICROWAVE ABLATION
审中-公开
微波放电期间皮肤表面电压波动比的管理
- Patent Title: MANAGEMENT OF VOLTAGE STANDING WAVE RATIO AT SKIN SURFACE DURING MICROWAVE ABLATION
- Patent Title (中): 微波放电期间皮肤表面电压波动比的管理
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Application No.: US14804656Application Date: 2015-07-21
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Publication No.: US20150320495A1Publication Date: 2015-11-12
- Inventor: JOSEPH D. BRANNAN , KAYLEN J. HALEY , KENLYN S. BONN
- Applicant: COVIDIEN LP
- Main IPC: A61B18/18
- IPC: A61B18/18

Abstract:
A dielectric spacer for use during microwave ablation of tissue is disclosed. The dielectric spacer includes a housing having a predetermined thickness and a skin-contacting bottom surface. The housing is configured to be filled with a dielectric material having a predetermined dielectric permittivity. The housing is further configured to be placed on the tissue in proximity with at least one microwave antenna assembly, wherein the thickness and the dielectric permittivity are configured to shift a maximum voltage standing wave ratio of the at least one microwave antenna assembly.
Public/Granted literature
- US10675089B2 Management of voltage standing wave ratio at skin surface during microwave ablation Public/Granted day:2020-06-09
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