Invention Application
- Patent Title: Hierarchical Wafer Lifetime Prediction Method
- Patent Title (中): 分层晶圆寿命预测方法
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Application No.: US14803137Application Date: 2015-07-20
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Publication No.: US20150323586A1Publication Date: 2015-11-12
- Inventor: Hsin-Ming Hou , Ji-Fu Kung
- Applicant: United Microelectronics Corp.
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L21/66

Abstract:
For improving wafer fabrication, yield and lifetime of wafers are predicted by determining coefficients of a yield domain for wafer yield prediction and a lifetime domain for a wafer lifetime prediction, an integral domain, an electric/layout domain, a metrology/defect domain, and a machine sensor domain in a hierarchical manner. With the aid of the hierarchically-determined coefficients, noises in prediction can be reduced so that precision of prediction results of the yields or the lifetimes of wafers can be raised.
Public/Granted literature
- US09958494B2 Hierarchical wafer lifetime prediction method Public/Granted day:2018-05-01
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