Invention Application
- Patent Title: FABRICATING RAISED FINS USING ANCILLARY FIN STRUCTURES
- Patent Title (中): 使用昂贵的结构来制作提升的FINS
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Application No.: US14279480Application Date: 2014-05-16
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Publication No.: US20150332972A1Publication Date: 2015-11-19
- Inventor: Xusheng WU , Jianwei PENG , Min-hwa CHI
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Main IPC: H01L21/8234
- IPC: H01L21/8234 ; H01L21/02
Abstract:
A method of fabricating a raised fin structure including a raised contact structure is provided. The method may include: providing a base fin structure; providing at least one ancillary fin structure, the at least one ancillary fin structure contacting the base fin structure at a side of the base fin structure; growing a material over the base fin structure to form the raised fin structure; and, growing the material over the at least one ancillary fin structure, wherein the at least one ancillary fin structure contacting the base fin structure increases a volume of material grown over the base fin structure near the contact between the base fin structure and the at least one ancillary fin structure to form the raised contact structure.
Public/Granted literature
- US09490174B2 Fabricating raised fins using ancillary fin structures Public/Granted day:2016-11-08
Information query
IPC分类:
