发明申请
- 专利标题: Beam Delivery for EUV Lithography
- 专利标题(中): 光束交付EUV光刻
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申请号: US14648452申请日: 2013-11-26
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公开(公告)号: US20150334813A1公开(公告)日: 2015-11-19
- 发明人: Jan Bernard Plechelmus VAN SCHOOT , Markus Franciscus Antoniu EURLINGS , Hermanus Johannes Maria KREUWEL
- 申请人: ASML NETHERLANDS B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 国际申请: PCT/EP2013/074710 WO 20131126
- 主分类号: H05G2/00
- IPC分类号: H05G2/00 ; G02B19/00 ; G02B27/09 ; G03F7/20
摘要:
A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics (550) operable to condition a beam of radiation so as to output a conditioned beam having a configurable beam diameter (b) and a plurality of mirrors (530a, 530b) operable to direct the conditioned beam of radiation to a plasma generation site. The beam delivery apparatus enables control of the axial position of the beam where the beam has a particular diameter, with respect to the beam's focus position (570). Also, a method is used to control the axial position of the location at a plasma generation site where a beam has a particular diameter, with respect to the beam's focus position.
公开/授权文献
- US10289006B2 Beam delivery for EUV lithography 公开/授权日:2019-05-14
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