Invention Application
US20150342320A1 ARTIFICIAL NAIL COMPOSITION, ARTIFICIAL NAIL, METHOD FOR FORMING ARTIFICIAL NAIL, METHOD FOR REMOVING ARTIFICIAL NAIL, AND NAIL ART KIT
审中-公开
人造指甲组合物,人造指甲,形成人造指甲的方法,移除人造钉的方法和指甲工艺品
- Patent Title: ARTIFICIAL NAIL COMPOSITION, ARTIFICIAL NAIL, METHOD FOR FORMING ARTIFICIAL NAIL, METHOD FOR REMOVING ARTIFICIAL NAIL, AND NAIL ART KIT
- Patent Title (中): 人造指甲组合物,人造指甲,形成人造指甲的方法,移除人造钉的方法和指甲工艺品
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Application No.: US14825362Application Date: 2015-08-13
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Publication No.: US20150342320A1Publication Date: 2015-12-03
- Inventor: Yukie WATANABE , Hidekazu OOHASHI , Junya ABE
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2013-073037 20130329
- Main IPC: A45D31/00
- IPC: A45D31/00 ; A61Q3/02 ; A61K8/49 ; A61K8/41 ; A61K8/42

Abstract:
It is an object of the present invention to provide an artificial nail composition having excellent stability over time and excellent surface gloss, removability, adhesion, and water resistance of an artificial nail obtained thereby, an artificial nail employing the artificial nail composition, a method for forming an artificial nail, a method for removing an artificial nail, and a nail art kit.An artificial nail composition comprising (Component A) an ethylenically unsaturated group- and primary amino group- and/or secondary amino group-containing compound, and (Component B) a photopolymerization initiator. Furthermore, Component A is preferably a specific compound represented by Formula (I) and/or a compound represented by Formula (II)
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