发明申请
- 专利标题： UNDER LAYER FILM-FORMING COMPOSITION FOR IMPRINTS AND METHOD FOR FORMING PATTERN
- 专利标题（中）： 底层成膜组合物和形成图案的方法
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申请号： US14860767申请日： 2015-09-22
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公开(公告)号： US20160009946A1公开(公告)日： 2016-01-14
- 发明人: Hirotaka KITAGAWA , Yuichiro ENOMOTO
- 申请人： FUJIFILM Corporation
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM CORPORATION
- 当前专利权人： FUJIFILM CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2013-063380 20130326
- 主分类号： C09D151/08
- IPC分类号： C09D151/08 ; C09D151/00 ; B29C59/00
摘要：
Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.
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